東京からフォトリソグラフィのナノプリント技術応用の甥合わせがあった。
広く応用されるまで10年かかるかもしれません。
日本政府が推進体制をつくる次世代半導体プロセスに使えれば良い。
現状での最新露光機の技術は液浸であるが
ルールは20nm程度。。
これ以上の微細化に役立つ技術になればいい。
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